HABUKA Hitoshi

Affiliation

Faculty of Engineering, Division of Materials Science and Chemical Engineering

Job Title

Professor

Date of Birth

1957

Research Fields, Keywords

Etching, Silicon, Process, Heating technology, Crystal Growth, Cleaning, Reactor, Silicon Carbide, Electronics materials, Surface

Mail Address

E-mail address



ORCID  https://orcid.org/0000-0001-9931-5915

The Best Research Achievement in Research Career 【 display / non-display

  • 【Published Thesis】 Model on Transport Phenomena and Epitaxial Growth of Silicon Thin Film in SiHCl3-H2 System under Atmospheric Pressure,  1996

    【Published Thesis】 Parallel Langmuir Processes for Silicon Epitaxial Growth in a SiHCl3-SiHx-H2 System  2017

    【Published Thesis】 Quick Cleaning Process for Silicon Carbide Chemical Vapor Deposition Reactor  2017

Education 【 display / non-display

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    1996

    Hiroshima University   Department of chemical engineering   Doctor Course   Completed

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    1981

    Kyoto University   Department of chemistry   Master Course   Completed

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    1979

    Niigata University   Department of chemistry   Graduated

Degree 【 display / non-display

  • Doctor of Engineering - Hiroshima University

  • Master of Science - Kyoto University

Campus Career 【 display / non-display

  • 2002.4
     
     

    Duty   Yokohama National UniversityFaculty of Engineering   Division of Materials Science and Chemical Engineering   Professor  

  • 2001.4
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    2002.3

    Duty   Yokohama National UniversityFaculty of Engineering   Division of Materials Science and Chemical Engineering   Associate Professor  

  • 2000.4
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    2001.3

    Duty   Yokohama National UniversitySchool of Engineering   Associate Professor  

  • 2018.4
     
     

    Concurrently   Yokohama National UniversityGraduate school of Engineering Science   Department of Chemistry, Chemical Engineering and Life Science   Professor  

  • 2011.4
     
     

    Concurrently   Yokohama National UniversityCollege of Engineering Science   Department of Chemistry, Chemical Engineering and Life Science   Professor  

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External Career 【 display / non-display

  • 2003.4
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    2004.3

     

  • 1986.4
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    2000.3

    Shin-Etsu Chemical Co.,   Ltd. Isobe R&D Center  

Academic Society Affiliations 【 display / non-display

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    応用物理学会

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    化学工学会

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    日本結晶成長学会

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    Electrochemical Society

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    American chemical Society

Research Areas 【 display / non-display

  • Manufacturing Technology (Mechanical Engineering, Electrical and Electronic Engineering, Chemical Engineering) / Chemical reaction and process system engineering

  • Nanotechnology/Materials / Applied physical properties

 

Research Career 【 display / non-display

  • Silicon epitaxial thin film growth

    Cooperative Research  

    Project Year:

  • SiC Crystal production technology

    The Other Research Programs  

    Project Year:

  • Analysis and development of cleaning equipment

    Project Year:

  • Adsorption and contamination of various molecules

    Project Year:

  • Heat quipment using radiation (Infrared, etc)

    The Other Research Programs  

    Project Year:

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Books 【 display / non-display

  • 先端パワーデバイス実務技術(エレクトロニクスシリーズ)

    羽深等(監修), 宮代文夫(監修), 山田 靖(監修)( Role: Joint author ,  「1.1パワーデバイス実装技術の重要性と人材育成」「2.2結晶およびウエハ材料」)

    シーエムシー出版  ( ISBN:978-4-7813-1612-3

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    Total pages:309   Responsible for pages:2-9、55-71   Language:Japanese Book type:Scholarly book

  • -5G/Beyond 5Gに向けた- 高速・高周波対応部材の最新開発動向

    郭 碧濤, 羽深 等 他( Role: Joint author ,  変性ビスマレイミド樹脂への低誘電性特性、高耐熱性の付与技術)

    技術情報協会  ( ISBN:978-4-86104-828-9

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    Total pages:653   Responsible for pages:第2章7節110-118   Language:Japanese Book type:Scholarly book

  • Manufacturing Systems: Recent Progress and Future Directions

    Mohamed Arezki (Editor), Hitoshi habuka( Role: Joint author ,  Parallel Langmuir Process ans Its Application for Silicon Epitaxial Film manufacturing)

    Nova Science Publishers  ( ISBN:978-1-53618-763-2

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    Total pages:562   Responsible for pages:第1章1-24   Language:English Book type:Scholarly book

  • 最新実用真空技術総覧

    著者 最新実用真空技術総覧編集委員会 (編)( Role: Joint author)

    エヌ・ティー・エス  ( ISBN:978-4-86043-559-2

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    Responsible for pages:651-655   Language:Japanese Book type:Scholarly book

  • Polycrystalline Films

    Hitoshi Habuka( Role: Joint author)

    Nova Publisher  ( ISBN:9781536108187

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    Language:English Book type:Scholarly book

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Papers 【 display / non-display

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Review Papers 【 display / non-display

  • Deposition and etching behaviour of boron trichloride gas at silicon surface

    Mitsuko Muroi and Ayami Yamada and Ayumi Saito and Hitoshi Habuka

    Journal of Crystal Growth   529   125301   2020.1

    DOI

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    Language:Japanese   Publishing type:Article, review, commentary, editorial, etc. (bulletin of university, research institution)   Publisher:Elsevier {BV}   Joint Work  

  • 化学工学年鑑、6.6CVDプロセス

    霜垣幸浩、羽深等、築根敦弘

    化学工学   79 ( 10 )   759 - 760   2015.10

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    Language:Japanese   Publishing type:Article, review, commentary, editorial, etc. (other)   Joint Work  

    化学気相堆積法に関わる化学工学研究・開発の平成26年における動向について解説した。

  • 化学工学年鑑、12. エレクトロニクス・実装プロセス工学、12.1 半導体材料プロセス

    化学工学   78 ( 10 )   729   2014.10

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    Language:Japanese   Publishing type:Article, review, commentary, editorial, etc. (other)   Single Work  

    エレクトロニクスに関わる化学工学研究・開発の平成25年における動向について解説した。

  • ミニマル集光型CVD炉

    池田伸一、石田由起、原史朗、羽深等、中戸克彦、三ヶ原孝則

    クリーンテクノロジー   43 - 45   2013.12

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    Language:Japanese   Publishing type:Article, review, commentary, editorial, etc. (other)   Joint Work  

    ハーフインチウエハに化学気相堆積させる場合の加熱方法について解説し、シリコンエピタキシャル成長の方法と条件について紹介した

  • 化学工学年鑑、12. エレクトロニクス・実装プロセス工学、12.1 半導体材料プロセス

    化学工学   77 ( 10 )   745   2013.10

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    Language:Japanese   Publishing type:Article, review, commentary, editorial, etc. (other)   Single Work  

    エレクトロニクスに関わる化学工学研究・開発の平成24年における動向について解説した。

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Works 【 display / non-display

  • Patent on measurement method for organic species concentration

    2000

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    Work type:Other  

  • Patent surface cleaning Process of silicon

    1999

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    Work type:Other  

  • Patent on Surface condition for crystal growth

    1997

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    Work type:Other  

  • Patent on process for obtaining uniform thickness of crystal film

    1996

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    Work type:Other  

  • Patent on producing light emitting cliodes

    1989

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    Work type:Other  

Awards 【 display / non-display

  • 空気清浄協会、論文賞

    2003    

Grant-in-Aid for Scientific Research 【 display / non-display

  • 水晶振動子法と多成分系有機物吸着汚染モデルによる表面吸着分子間相互作用測定法研究

    2006.4 - 2008.3

    科学研究費補助金  Grant-in-Aid for Scientific Research(C)

    Investigator(s):羽深等

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    Grant type:Competitive

Presentations 【 display / non-display

  • Increase in Silicon Film Deposition Rate in a SiHCl3-SiHx-H2 System

    A. Saito, A. Yamada, A. Sakurai and H. Habuka

    18th International Conference on Crystal Growth and Epitaxy  (Nagoya, Japan) 

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    Event date: 2016.8

    Language:English   Presentation type:Poster presentation  

    Venue:Nagoya, Japan  

  • Transport Phenomena in a Slim Vertical CVD Reactor for Minimal Manufacturing

    A. Yamada, N. Li, M. Matsuo, H. Habuka, Y. Ishida, S. Ikeda and S. Hara

    18th International Conference on Crystal Growth and Epitaxy  (Nagoya, Japan) 

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    Event date: 2016.8

    Language:English   Presentation type:Oral presentation (general)  

    Venue:Nagoya, Japan  

  • In Situ cleaning process of silicon carbide epitaxial reactor for removing film-type deposition formed on susceptor

    Kosuke Mizuno, Hitoshi Habuka, Yuuki Ishida, Toshiyuki Ohno

    International Conference on Silicon Carbide and Related Materials 2015  (Naxos, Italy) 

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    Event date: 2015.10

    Language:The in addition, foreign language   Presentation type:Oral presentation (general)  

    Venue:Naxos, Italy  

  • Etching rate behavior of 4H-silicon carbide epitaxial film using chlorine trifluoride gas

    Asumi Hirooka, Hitoshi Habuka, Tomohisa Kato

    International Conference on Silicon Carbide and Related Materials 2015  (Naxos, Italy) 

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    Event date: 2015.10

    Language:The in addition, foreign language   Presentation type:Oral presentation (general)  

    Venue:Naxos, Italy  

  • Numerical evaluation of silicon epitaxial growth for 450mm Ø substrate

    M. Matsui and H. Habuka

    EuroCVD20  (Sempach, Switzerland) 

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    Event date: 2015.7

    Language:The in addition, foreign language   Presentation type:Oral presentation (general)  

    Venue:Sempach, Switzerland  

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Preferred joint research theme 【 display / non-display

  • Study on Reactors for Crystal Growth for producing electronics materials

Past of Collaboration and Commissioned Research 【 display / non-display

  • Etching technology for etching various materials

    Cooperative Research within Japan  

    Project Year: 2004.11  -  2007.3 

  • Analysis of transport phenomena in a thin film formation reactor

    Cooperative Research within Japan  

    Project Year: 2004.4  -  2007.3 

  • Semiconductor epitaxial growth reactor technology

    Funded Research offered by Enterprises  

    Project Year: 2001.7  -  2001.12 

 

Charge of on-campus class subject 【 display / non-display

  • 2021   エレクトロニクス実装実習F

    Graduate school of Engineering Science

  • 2021   エレクトロニクス実装実習S

    Graduate school of Engineering Science

  • 2021   イノベーション化学プロセス実習F

    Graduate school of Engineering Science

  • 2021   イノベーション化学プロセス実習S

    Graduate school of Engineering Science

  • 2021   プロセス工学技術創生実習F

    Graduate school of Engineering Science

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Committee Memberships 【 display / non-display

  • 国立大学教育研究評価委員会

    2020.2 - 2021.3  専門委員

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    Committee type:Other 

  • 科学研究費委員会

    2018.12 - 2019.11  専門委員

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    Committee type:Academic society 

  • 第145委員会

    2008.4  委員

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    Committee type:Other 

  • 反応工学部会CVD反応部会

    2007.2  企画幹事

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    Committee type:Other 

  • 理事会

    2006.4  副理事長

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    Committee type:Other 

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Social Contribution(Extension lecture) 【 display / non-display

  • 社外取締役

    Role(s): Other

    関東電化工業株式会社  取締役会  本社(東京)  2020.7