Affiliation |
Faculty of Engineering, Division of Intelligent Systems Engineering |
Job Title |
Professor |
Date of Birth |
1957 |
Mail Address |
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Education 【 display / non-display 】
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-1985
The University of Tokyo Department of Electronic Engineering Doctor Course Completed
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-1982
The University of Tokyo Department of Electronic Engineering Master Course Completed
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-1980
The University of Tokyo Depaartment of Electronic Engineering Graduated
Degree 【 display / non-display 】
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Doctor of Engineering - The University of Tokyo
Campus Career 【 display / non-display 】
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2003.10
Duty Yokohama National UniversityFaculty of Engineering Division of Intelligent Systems Engineering Professor
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2001.4-2003.9
Duty Yokohama National UniversityFaculty of Engineering Division of Intelligent Systems Engineering Associate Professor
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1999.4-2001.3
Duty Yokohama National UniversityGraduate School of Engineering Associate Professor
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1989.6-1999.3
Duty Yokohama National UniversitySchool of Engineering Associate Professor
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1985.4-1989.5
Duty Yokohama National UniversitySchool of Engineering Lecturer
External Career 【 display / non-display 】
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1997.6-1999.3
University of Tokyo VLSI Design and Education Center Associate Professor (as old post name)
Research Areas 【 display / non-display 】
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Manufacturing Technology (Mechanical Engineering, Electrical and Electronic Engineering, Chemical Engineering) / Electric and electronic materials
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Manufacturing Technology (Mechanical Engineering, Electrical and Electronic Engineering, Chemical Engineering) / Electron device and electronic equipment
Research Career 【 display / non-display 】
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Silicon gatestuck
Project Year:
Books 【 display / non-display 】
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アナログ集積回路設計技術
浅田邦博,永田 穰 監修( Role: Joint author)
培風館
Language:Japanese Book type:Other
8.帰還 を担当
Thesis for a degree 【 display / non-display 】
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SiO2中のトラップによる電子捕獲に関する研究
羽路 伸夫
1985.3
Doctoral Thesis Single Work
東京大学
MOSFETのゲート絶縁膜に用いられるシリコン酸化膜中の電子トラップについて,アバランシェ注入による測定システムの構築と,トラップ密度と捕獲断面積の新しい解析手法を提案し,その有効性を明らかにした.また,プラズマ陽極酸化に塩素を添加することが,膜質の改善に有効であることも明らかにした. -
電子ビームアニールに関する研究
羽路 伸夫
1982.3
Master Thesis Single Work
東京大学
Siへのイオン打ち込み後のダメージの回復について,不純物の再分布が小さい低電圧大電流の走査型電子ビームアニールを行い,特性を評価した.また,本方法を用いて自己整合型MOSFETを試作した.
Papers 【 display / non-display 】
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Preparation of Amorphous Fluorinated Carbon Film Using Low Global-Warming Potential Gas, C4F6, by Plasma Enhanced Chemical Vapor Deposition
Hiroki Watanabe, Takumi Tokimitsu, Jyunko Shiga, Nobuo Haneji and Yukihiro Shimogaki
Jap. J. Appl. Phys 45 ( 6 ) L151 - L153 2006.2 [Reviewed]
Language:English Publishing type:Research paper (scientific journal) Joint Work
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Improved Etched Surface Morphology in Electron Cyclotron Resonance-Reactive Ion Etching of GaN by Cyclic Injection of CH4/H2/Ar and O2 with Constant Ar Flow
Taro Arakawa, Yoshiki Awa, Tomoyoshi Ide, Nobuo Haneji, Kunio Tada, Masakazu Sugiyama, Hiromasa Shi … Show more authors
Taro Arakawa, Yoshiki Awa, Tomoyoshi Ide, Nobuo Haneji, Kunio Tada, Masakazu Sugiyama, Hiromasa Shimizu, Yukihiro Shimogaki and Yoshiaki Nakano Hide authors
Jap. J. Appl. Phys 44 ( 7B ) 5819 - 5823 2005.6 [Reviewed]
Language:English Publishing type:Research paper (scientific journal) Joint Work
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Electrical and Thermal Stability Characteristics of HfCN Films as Metal Gate-Electrode Synthesized by Metalorganic Chemical Vapor Deposition
Wenwu Wang, Toshihide Nabatame, Nobuo Haneji and Yukihiro Shimogaki
Jap. J. Appl. Phys 44 ( 32 ) L1019 - 1021 2005.6 [Reviewed]
Language:English Publishing type:Research paper (scientific journal) Joint Work
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液相堆積シリコン酸化膜/シリコン界面特性の改善
羽路伸夫,ポーンケオ・チャンタマリー,毛利重信
電気学会論文誌C 123 ( 10 ) 1695 - 1699 2003.10 [Reviewed]
Language:Japanese Publishing type:Research paper (scientific journal) Joint Work
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Electron Cyclotron Resonance-Reactive Ion Etching of III-V Semiconductors by Cyclic Injection of CH4/H2/Ar and O2 with Constant Ar Flow
N. Haneji, G. Segami, T. Ide, T. Suzuki, T. Arakawa, K. Tada, Y. Shimogaki and Y. Nakano
Jpn. J. Appl. Phys. 42 ( 6B ) 3958 - 3961 2003.6 [Reviewed]
Language:English Publishing type:Research paper (scientific journal) Joint Work
Review Papers 【 display / non-display 】
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シリコン酸化膜を水中で作る-室温での液相堆積法
BREAK THROUG 161 7 - 10 1999
Language:Japanese Publishing type:Article, review, commentary, editorial, etc. (other) Single Work
Past of Collaboration and Commissioned Research 【 display / non-display 】
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Embedded Capacitance in WLP
Cooperative Research within Japan
Project Year: 2005.10 - 2007.3
Charge of on-campus class subject 【 display / non-display 】
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2022 Advanced Semiconductor Devices
Graduate school of Engineering Science