Faculty of Engineering, Division of Materials Science and Chemical Engineering


Associate Professor

Date of Birth


Research Fields, Keywords

Quantum Chemistry,Plasma Chemistry,Polymer Chemistry,Surface Science,Ionic Liquid

Mail Address

E-mail address

Graduating School 【 display / non-display


    The University of Tokyo   Faculty of Engineering   Graduated

Graduate School 【 display / non-display


    The University of Tokyo  Graduate School, Division of Engineering    Completed

External Career 【 display / non-display

  • 1986.10

      Research Assistant  

Field of expertise (Grants-in-aid for Scientific Research classification) 【 display / non-display

  • Plasma science

  • Thin film/Surface and interfacial physical properties

  • Basic chemistry


Research Career 【 display / non-display

  • study on structure and property of semiconductors

    Project Year:  -   

  • Basic Study on Electronic Materials based on Quantum Chemistry

    Project Year:  -   

  • Quantum Chemical Study on Plasma Chemical Reactions

    Project Year:  -   

  • Surface Science Based on Quantum Chemistry

    Project Year:  -   

  • quantum chemical study on the structure and reactivity of nanosheets.

    Project Year:  -   

Books 【 display / non-display

  • Progress in Organosilicon Chemistry

    Hideomi Koinuma, Kota Sato (Part: Joint Work )

    Gordon & Breach  1995

  • Plasma properties, deposition and etching

    (Part: Single Work )

    Trans Tech Publications  1993 ISBN: 0-87849670-x

  • New Functionality Materials

    Y. Ypshida, H. Koinuma (Part: Joint Work )

    Elsevier  1993 ISBN: 044481616X

Papers 【 display / non-display

  • Theoretical Study on a Stable Structure and Hydrogen Adsorption of Hexagonal Boron Phosphide based on Density Functional Theory

    Kota Sato, Masakazu Sasaki, Haruka Asano

    Japanese Journal of Applied Physics   52 ( 12 )   125801 - 1-5   2013.11  [Refereed]

    Joint Work

     View Summary


    Web of Science DOI

  • Ab Initio Molecular Orbital Study on Acceleration Mechanism of Silane Plasma Chemical Vapor Deposition by DIborane

    Kota Sato, Yasuyo Kubota

    Appl. Phys. Express   4 ( 5 )   056202   2011.04  [Refereed]

    Joint Work

     View Summary


    Web of Science DOI

  • An Ab initio Molecular Orbital Study on F Radical Reactions to Graphite Surface and the Subsequent Etching Process

    6th INternational Conference on Reactive Plasmas     479 - 480   2006  [Refereed]

    Joint Work

  • Thermoelectric properties of photo-and thermal CVD boron and boron phosphide films

    Kumashiro Y; Enomoto T; Sato K; Abe Y; Hirata K; Yokoyama T

    Journal of Solid State Chemistry   177 ( 2 )   529 - 532   2004  [Refereed]

    Joint Work

    Web of Science DOI

  • The properties of B-Sb thin films prepared by molecular flow region PVD process

    Kumashiro Y; Nakamura K; Sato K; Ohtsuka M; Ohishi Y; Nakano M; Doi Y

    Journal of Solid State Chemistry   177 ( 2 )   533 - 536   2004  [Refereed]

    Joint Work

    Web of Science DOI

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Review Papers 【 display / non-display

  • Highly Cross-linked Polymer Networks of Amorphous SIlicon Alloys: Quantum Chemical Studies on Plasma and Photochemical Processes

    Kota Sato, Hideomi Koinuma

    Progress in Polymer Science   21   255 - 297   1996

    Introduction and explanation (scientific journal)   Joint Work