OYAMA Toshiyuki

Affiliation

Faculty of Engineering, Division of Materials Science and Chemical Engineering

Job Title

Professor

Research Fields, Keywords

Photosensitive polymers, Thermosetting resin, Polymer reaction, Polymer catalysts, Polymer reagent, Protein-like polymers

Mail Address

E-mail address



The Best Research Acheivement as Researcher Life 【 display / non-display

  • 【Published Thesis】 Photosensitive polyarylates based on reaction development patterning  2002

The Best Research Achievement in the last 5 years 【 display / non-display

  • 【Published Thesis】 Photosensitive engineering plastics based on reaction development patterning  2018

    【Published Thesis】 Selective preparation of oligomeric naphthylene ether and its applications to epoxy resin for silicon carbide power semiconductor device materials  2016

Graduating School 【 display / non-display

  •  
    -
    1994

    Kyoto University   Faculty of Engineering   Department of Synthetic Chemistry   Graduated

Graduate School 【 display / non-display

  •  
    -
    1999

    Kyoto University  Graduate School, Division of Engineering  Department of Polymer Chemistry  Doctor Course  Completed

Degree 【 display / non-display

  • Doctor (Engineering) -  Kyoto University

Academic Society Affiliations 【 display / non-display

  • 2004
     
     
     

    American Chemical Society

  • 2004
     
     
     

    Japan Institute of Electronics Packaging

Field of expertise (Grants-in-aid for Scientific Research classification) 【 display / non-display

  • Device related chemistry

  • Polymer chemistry

  • Polymer/Textile materials

 

Research Career 【 display / non-display

  • Development of novel high performance thermosetting resins

    Cooperative Research  

    Project Year:  -   

  • Novel photosensitive pdymers by reaction development patterning

    New Energy Technology Research and Development  

    Project Year:  -   

  • Creation of polymers exhibiting their functions based on the same principle as natural proteins

    Project Year:  -   

Books 【 display / non-display

  • Novel Molecular Design and Development of Benzoxazine Resin

    (Part: Contributor )

    2018.09 ISBN: 978-4-7813-13

  • Blending design, characterization and new applications of UV curable resins

    (Part: Single Work )

    2017.11 ISBN: 9784861046834

  • How to choose and use functional monomers-Case studies

    (Part: Single Work )

    2017.07 ISBN: 9784861046643

  • Synthesis of New Materials Based on Element-Blocks and Their Applications

    (Part: Joint Work )

    2016.06 ISBN: 9784781311609

  • Encyclopedia of Polymeric Nanomaterials

    Kobayashi, Shiro, Müllen, Klaus監修(分担執筆:鈴木将人,大山俊幸ほか多数) (Part: Joint Work , Range: “Cross-Linked Polymer Synthesis”の章を単独執筆 )

    Springer-Verlag  2015.07 ISBN: 9783642296475

     View Summary

    架橋ポリマーは熱硬化性樹脂やゲルとして利用されるため、その合成は学術面・実用面の両方で重要となっている。本章では、架橋ポリマー合成の基礎について述べたのちに、各種の架橋法について解説し、最後に最新のトピックを掲載した。

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Thesis for a degree 【 display / non-display

  • Synthesis of Novel Aprotic Polar Polymers(博士論文)

    大山 俊幸 

      1999.03

    Doctoral Thesis   Single Work

     View Summary

    京都大学大学院工学研究科 非プロトン性極性溶媒であるジメチルスルホキシド(DMSO)、ヘキサメチルホスホルアミド(HMPA)およびN,N-ジメチルアセトアミド(DMAc)の高分子類縁体であるポリDMSO、脂肪族ポリスルホキシド、ポリHMPAおよびポリ(N,N-ジメチルカルバモイルメチレン)をそれぞれ合成した。これらのポリマーが溶解性や相溶性などにおいてその繰り返し構造に基づく興味ある特性を示すことを明らかにし、これら一連の高分子を「非プロトン性極性高分子」と名付けた。またポリスルフィドの主鎖中の硫黄原子を、不斉酸化によって化学選択的および立体選択的にスルホキシドへと酸化することによりキラルポリスルホキシドを合成し、高分子反応によってタクティシティーが制御できることを初めて示した。

  • Synthesis of Novel Aprotic Polar Polymers(修士論文)

    大山俊幸 

      1996.03

    Master Thesis   Single Work

     View Summary

    京都大学大学院工学研究科 非プロトン性極性溶媒であるジメチルスルホキシドの高分子類縁体である脂肪族ポリスルホキシドを、脂肪族ポリスルフィド中の硫黄原子を選択的にスルホキシドへと酸化することにより合成した。得られたポリスルホキシドの相溶性や酸化剤としての利用について検討し、また脂肪族ポリスルホキシド-ポリエチレンオキシドブロック共重合体も合成した。さらにヘキサメチルホスホルアミドの高分子類縁体の合成についての基礎的な検討も行った。

Papers 【 display / non-display

  • Development of a Novel Epoxy Resin Having Cardo Structure

    Yuichiro Tokoro, Yudai Yaginuma, Toshiyuki Oyama

    Journal of Photopolymer Science and Technology ( Wiley Online Library )  Vol.32 ( 3 )   463 - 467   2019.05  [Refereed]

    Joint Work

  • Synthesis and Characterization of (Di)Benzosilaphenalenes

    Yuichiro Tokoro, Toshiyuki Oyama

    Chemistry Letters   47   130 - 133   2018  [Refereed]

    Joint Work

    Web of Science DOI

  • Photosensitive engineering plastics based on reaction development patterning

    Toshiyuki Oyama

    Polymer Journal ( NATURE PUBLISHING GROUP )  50 ( 6 )   419 - 429   2018  [Refereed]

    Single Work

    Web of Science DOI

  • Photocurable ABA triblock copolymer-based ion gels utilizing photodimerization of coumarin

    R. Tamate, T. Ueki, A. Mizutani Akimoto, R. Yoshida, T. Oyama, H. Kokubo, M. Watanabe

    RSC Advances ( ROYAL SOC CHEMISTRY )  8 ( 7 )   3418 - 3422   2018  [Refereed]

    Joint Work

    Web of Science DOI

  • Formation of Fine Pattern by Reaction Development Patterning Using Photo-Base Generator and Acidic Developers

    Toshiyuki Oyama, Yuichiro Tokoro, Hiromi Hayashi

    Journal of Photopolymer Science and Technology ( TECHNICAL ASSOC PHOTOPOLYMERS,JAPAN )  31 ( 5 )   613 - 616   2018  [Refereed]

    Joint Work

    Web of Science DOI

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Review Papers 【 display / non-display

  • Toughening of epoxy resins by polyesters

    Secchaku   48 ( 10 ) 469 - 476   2004

    Introduction and explanation (scientific journal)   Joint Work

  • Chracterization of positive-type photosensitive polyimide films formed by electrodepositon coating

    上村貴之、友井正男、板谷博

    Journal of Photopolymer Science and Technology   16 ( 2 ) 279 - 284   2003

    Introduction and explanation (others)   Joint Work

  • Electrodeposition of polyimides and its application

    Kobunshi-Kako   51 ( 11 ) 490 - 498   2002

    Introduction and explanation (scientific journal)   Joint Work

  • Novel principle fro changing engineering plastics to photosensitive polymers : Reaction development patterning

      2 ( 4 ) 90 - 96   2002

    Introduction and explanation (scientific journal)   Joint Work

  • Photoresists based on reaction development patterning (RDP)

      22 ( 5 ) 24 - 33   2002

    Introduction and explanation (scientific journal)   Joint Work

Academic Awards Received 【 display / non-display

  • Award for the Outstanding Paper published in the Polymer Journal

    2005.05    

Presentations 【 display / non-display

  • Selective surface modification at photo-irradiated area of polymer films by reaction development patterning

    Toshiyuki Oyama  [Invited]

    International Conference on Frontiers in Materials Processing, Applications Research and Technology (FiMPART'17)  (Bordeaux Convention Center, France)  2017.07  

  • A novel mechanism to give photosensitivity to engineering plastics: Reaction development patterning

    The 19th International Display Workshops in conjunction with Asia Display 2012 (IDW/AD '12)  2012.12.05  

  • A novel mechanism to give photosensitivity to polyimides and other engineering plastics: Reaction development patterning

    1st International Conference on Emerging Advanced Nanomaterials (ICEAN 2012)  2012.10.24  

  • A novel mechanism to give photosensitivity to engineering plastics: Reaction development patterning

    2012 Spring Meeting of the Polymer Society of Korea  2012.04.12  

  • Photosensitive polyimides without side chain: negative-tone reaction development patterning

    RadTech UV & EB 2010 Technical Conference  2010.05.24  

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Preferred joint research theme 【 display / non-display

  • Preparation and toughening of thermosetting resins

  • Development of photosensitive engineering plastics based on novel principles