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Affiliation |
Institute for Multidisciplinary Sciences |
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Job Title |
Specially Appointed Professor |
SAGA Koichiro
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Degree 【 display / non-display 】
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Doctor of Engineering - Waseda University
Campus Career 【 display / non-display 】
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2026.7
Duty Yokohama National UniversityInstitute for Multidisciplinary Sciences Specially Appointed Professor
Academic Society Affiliations 【 display / non-display 】
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2017.1
Electrochemical Society
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2007.4
応用物理学会
Research Areas 【 display / non-display 】
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Nanotechnology/Materials / Nanomaterials / Semiconductor Processing
Thesis for a degree 【 display / non-display 】
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Chemical Contamination Control in ULSI Processing
嵯峨幸一郎
2006.7
Doctoral Thesis Single Work [Reviewed]
Papers 【 display / non-display 】
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Depth Profile Analysis of Metals Gettered by Oxide Precipitates in Silicon Substrates
Saga, K and Ohno, R
ECS Journal of Solid-State Science and Technology 6 ( 5 ) 231 - 234 2017.5 [Reviewed]
Language：English Publishing type：Research paper (scientific journal) Joint Work
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Deep Levels in W-Doped Czochralski Silicon
Simoen, E ; Saga, K ; Vrielinck, H ; Lauwaert, J
ECS Journal of Solid-State Science and Technology 4 ( 5 ) P3001 - 3007 2016.5 [Reviewed]
Language：English Publishing type：Research paper (scientific journal) Joint Work
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Behavior of Transition Metals Penetrating Silicon Substrate through SiO2 and Si3N4 Films by Arsenic Ion Implantation and Annealing
Saga, K; Ohno, R ; Shibata, D ; Kobayashi, S ; Sueoka, K
ECS Journal of Solid-State Science and Technology 4 ( 5 ) 131 2015.5 [Reviewed]
Language：English Publishing type：Research paper (scientific journal) Joint Work
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Effect of Wafer Rotation on Photoresist Stripping in Supercritical CO_2
SAGA K.
Solid State Phenomena 134 355 - 358 2008 [Reviewed]
Language：English Publishing type：Research paper (scientific journal) Single Work
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Wafer Cleaning Using Supercritical CO_2 in Semiconductor and Nanoelectronic Device Fabrication
SAGA K.
Solid State Phenomena 134 97 2008 [Reviewed] [Invited]
Authorship：Lead author, Last author, Corresponding author Language：English Publishing type：Research paper (scientific journal) Single Work
Review Papers 【 display / non-display 】
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嵯峨 幸一郎, 岩元 勇人
材料の科学と工学 : 日本材料科学会誌 56 ( 2 ) 49 - 54 2019
Language：Japanese Publishing type：Article, review, commentary, editorial, etc. (bulletin of university, research institution) Publisher：東京 : 日本材料科学会 ; 2002- Joint Work
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Controlling Metallic Contamination in Advanced ULSI Processing
SAGA Koichiro
Hyomen Kagaku 37 ( 3 ) 110 - 115 2016 [Reviewed] [Invited]
Authorship：Lead author, Last author, Corresponding author Language：Japanese Publishing type：Article, review, commentary, editorial, etc. (bulletin of university, research institution) Publisher：The Surface Science Society of Japan Single Work
Presentations 【 display / non-display 】
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Metallic Contamination Control in CMOS image Sensor Processing and Analytical Techniques
Koichiro Saga [Invited]
The 2026 International Conference on Frontiers of Characterization and Metrology for Nanoelectronics (FCMN) NIST
Event date： 2026.3
Language：English Presentation type：Oral presentation (invited, special)
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Metrology and Inspection Technologies to Accelerate Next-Generation ULSI Device Development
Koichiro Saga [Invited]
SEMI テクノロジーシンポジウム2025 SEMI
Event date： 2025.12
Language：Japanese Presentation type：Oral presentation (invited, special)
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Metallic Contamination Control in CMOS image Sensor Processing
Koichiro Saga [Invited]
THE 17th SYMPOSIUM ON ULTRA CLEAN PROCESSING (UCPSS 2025) IMEC
Event date： 2025.9
Language：English Presentation type：Oral presentation (invited, special)
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Ion Implanted Photoresist Stripping in Supercritical CO_2
SAGA K.
Proc. 8^<th> Int'l Symposium on Supercritical Fluids (ISSF2006) 2006
Event date： 2006
Language：English Presentation type：Oral presentation (general)
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Dependence of spatial resolution on probe load in SSRM measurements
Yoshigiwa Jun, Saga Koichiro
JSAP Annual Meetings Extended Abstracts 2019.2 The Japan Society of Applied Physics
Event date： 2019.2
Language：Japanese Presentation type：Oral presentation (general)